Effects of oxygen and nitrogen on carbon nanotube growth using a microwave plasma chemical vapor deposition technique

D. J. Yang*, Q. Zhang, S. F. Yoon, J. Ahn, S. G. Wang, Q. Zhou, Q. Wang, Jingqi Li

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    17 Scopus citations

    Abstract

    In this paper, we studied the effects of oxygen (O2) and nitrogen (N2) on the growth of carbon nanotubes (CNTs) prepared using microwave plasma-enhanced chemical vapor deposition (MPECVD). CNTs were prepared with 20-100-nm-sized Ni catalyst grains under three different groups of plasma conditions. Scanning electron microscopy (SEM) results show that the quality of CNTs is improved and number density greatly increased with addition of N2 and O 2 in the process. The morphology and Ni composition strongly suggest that the grain size and composition of the Ni catalyst can be modified by the N2 and O2 plasma pretreatments. A nitride-enhanced growth mechanism is also discussed.

    Original languageEnglish (US)
    Pages (from-to)288-291
    Number of pages4
    JournalSurface and Coatings Technology
    Volume167
    Issue number2-3
    DOIs
    StatePublished - Apr 22 2003

    Keywords

    • Carbon nanotubes
    • Microwave plasma-enhanced chemical vapor deposition (MPECVD)
    • Nitrogen
    • Oxygen

    ASJC Scopus subject areas

    • Chemistry(all)
    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Materials Chemistry

    Fingerprint Dive into the research topics of 'Effects of oxygen and nitrogen on carbon nanotube growth using a microwave plasma chemical vapor deposition technique'. Together they form a unique fingerprint.

    Cite this