Effect of Rapid Thermal Annealing (RTA) on n-contact of 980 nm oxide VCSEL

M. S. Khairul Anuar*, Mohd Sharizal Bin Alias, S. M. Mitani, Y. Mohamed Razman, A. F. Awang Mat, P. K. Choudhury

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

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Engineering & Materials Science