Effect of rapid thermal annealing on strain in ultrathin strained silicon on insulator layers

T. S. Drake*, C. Ní Chléirigh, M. L. Lee, A. J. Pitera, E. A. Fitzgerald, D. A. Antoniadis, D. H. Anjum, J. Li, R. Hull, N. Klymko, J. L. Hoyt

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    Physics & Astronomy