Dual Beam Lithography (FIB + EBL) for nanometric structures

Stefano Cabrini*, Alessandro Carpentiero, Luca Businaro, Patrizio Candeloro, Filippo Romanato, Enzo Di Fabrizio

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

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Engineering & Materials Science