Digital Holography Microscopy (DHM): Fast and robust systems for Industrial Inspection with interferometer resolution

Yves Emery*, Etienne Cuche, François Marquet, Nicolas Aspert, Pierre Marquet, Jonas Kühn, Mikhail Botkine, Tristian Colomb, Frederic Montfort, Florian Charrière, Christian Depeursinge

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

17 Scopus citations

Abstract

With the recent technological advances, there is an increasing need for measurement systems providing interferometer resolution for inspection of large quantities of individual samples in manufacturing environments. Such applications require high measurement rates, robustness, ease of use, and non-contact systems. We show here that Digital Holographic Microscopy (DHM), a new method that implements digitally the principle of holography, is particularly well suited for such industrial applications. With the present computers power and the developments of digital cameras, holograms can be numerically interpreted within a tenth of second to provide simultaneously: the phase information, which reveals object surface with vertical resolution at the nanometer scale along the optical axis, and intensity images, as obtained by conventional optical microscope. The strength of DHM lies in particular on the use of the so-called off-axis configuration, which enables to capture the whole information by a single image acquisition, i.e. typically during a few ten of microseconds. These extremely short acquisition times make DHM systems insensitive to vibrations. These instruments can operate without vibration insulation means, making them a cost effective solution not only for R&D, but also especially for an implementation on production lines. Numerous application examples are presented in this paper such as shape and surface characterization of high aspect ratio micro-optics, surface nanostructures, and surface roughness.

Original languageEnglish (US)
Article number70
Pages (from-to)930-937
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5856 PART II
DOIs
StatePublished - Dec 19 2005
EventOptical Measurement Systems for Industrial Inspection IV - Munich, Germany
Duration: Jun 13 2005Jun 17 2005

Keywords

  • Digital Holography Microscopy
  • Industrial Inspection
  • Interferometer resolution
  • Real time

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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