Digital holographic microscopy for silicon microsystems metrology

Yves Delacrétaz*, Christian Depeursinge

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Scopus citations

Abstract

We propose to use digital holographic microscopy (DHM) with an illumination in the near infrared spectrum bandwidth, where the silicon is known to have small absorption. With such an illumination condition, it is possible to observe a wider range of specimens than in the visible spectrum, providing a new metrology technique for 3D silicon micro-systems characterization. Suitability of DHM with near infrared illumination for micro-optical elements and wafer inspection is demonstrated. The intrinsic robustness and speed of the method place DHM as a valuable candidate for real-time quality check inside production chains, opening a wide field of applications in quality control.

Original languageEnglish (US)
Title of host publicationSilicon Photonics and Photonic Integrated Circuits II
Volume7719
DOIs
StatePublished - 2010
Externally publishedYes
EventSilicon Photonics and Photonic Integrated Circuits II - Brussels, Belgium
Duration: Apr 12 2010Apr 16 2010

Other

OtherSilicon Photonics and Photonic Integrated Circuits II
CountryBelgium
CityBrussels
Period04/12/1004/16/10

Keywords

  • Digital Holography
  • near infrared

ASJC Scopus subject areas

  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Applied Mathematics
  • Condensed Matter Physics

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