Design of photoresists with reduced environmental impact. II. water-soluble resists based on photocrosslinking of poly(2-lsopropenyl-2-oxazoline)

J. M. Havard*, M. Yoshida, D. Pasini, N. Vladimirov, Jean Frechet, D. R. Medeiros, K. Patterson, S. Yamada, C. G. Willson, J. D. Byers

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

29 Scopus citations

Abstract

The performance of water- and solvent-cast, two-component photoresist films containing poly(2-isopropenyl-2-oxazoline) or poly(2-isopropenyl-2-oxazoline-costyrene) with a photoacid generator has been investigated. These materials afford negative-tone images after deep-UV exposure and development in a suitable medium (water or toluene). Resist solutions prepared from polymers containing at least 80 mol % 2-isopropenyl-2-oxazoline may be cast from and developed in pure water. Features of higher quality can be obtained when the resist is cast from 2-methoxyethanol, probably because side reactions such as partial hydrolysis of the pendant oxazoline rings in aqueous environments are avoided. It was possible to resolve micrometer scale patterns using ca. 200 mJ/cm2 of irradiation at 254 nm, followed by heating 2 min at 130°C and development in water alone. Image quality and etch resistance were improved using copolymers containing up to 20 mol % of stvrene repeat units.

Original languageEnglish (US)
Pages (from-to)1225-1236
Number of pages12
JournalJournal of Polymer Science, Part A: Polymer Chemistry
Volume37
Issue number9
DOIs
StatePublished - May 1 1999

Keywords

  • Chemical amplification
  • Environmental enhancement
  • Melamine
  • Photoacid generator
  • Photocrosslinking
  • Photoresist
  • Polyoxazoline

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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