Dependency of the band gap of electrodeposited Copper oxide thin films on the concentration of copper sulfate (CuSO4.5H2O) and pH in bath solution for photovoltaic applications

Md. Anisul Islam, Sheikh Jaber Nurani, Md. Adnan Karim, Abu Sadat Md. Sayem Rahman, Md. Md. Ansar Ali Abdul Halim

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

In this study, Copper oxide thin films were deposited on copper plate by electrodeposition process in an electrolytic bath containing CuSO4.5H2O, 3M lactic acid and NaOH. Copper oxide films were electrodeposited at different pH and different concentration of CuSO4.5H2O and the optical band gap was determined from their absorption spectrum which was obtained from UV-Vis absorption spectroscopy. It was found that copper oxide films which were deposited at low concentration of CuSO4.5H2O have higher band gap than those deposited at higher bath concentration. The band gap of copper oxide films also significantly changes with pH of the bath solution. It was also observed that with the increase of the pH of bath solution band gap of copper oxide film decreased. © 2015 IEEE.
Original languageEnglish (US)
Title of host publication2015 International Conference on Electrical & Electronic Engineering (ICEEE)
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages229-232
Number of pages4
ISBN (Print)9781509019397
DOIs
StatePublished - Mar 10 2016

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