Dependence of si-faceted dendrite growth orientation on twin spacing and undercooling

Xinbo Yang*, K. Fujiwara, K. Maeda, J. Nozawa, H. Koizumi, S. Uda

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

Si-faceted dendrites growth orientation as a function of twin spacing and undercooling were investigated by in situ observation, and the mechanisms of the growth behaviors were discussed and clarified. The growth orientation of Si-faceted dendrites strongly depends on the twin spacing and undercooling. For a given undercooling, a dendrite with twin spacing narrower than the critical twin spacing preferentially grows in the «110» direction, whereas growth in the «112» direction preferentially occurs for a dendrite with twin spacing wider than the critical twin spacing. The critical twin spacing for stable faceted dendrite growth increases as the undercooling increases. In the case of low undercooling (∼10 K < δT ≲ 15 K), dendrites dominantly grow in the «112» direction. For high undercooling (∼25 K< δT ≲ 100 K), dendrites preferentially grow in the «110» direction. «110» and «112» growth directions occur with equal frequency for intermediate values of undercooling (∼15 K < δT ≤ 25 K).(Figure Presented)

Original languageEnglish (US)
Pages (from-to)1402-1410
Number of pages9
JournalCrystal Growth and Design
Volume11
Issue number4
DOIs
StatePublished - Apr 6 2011

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

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