Dendrimer-based self-assembled monolayers as resists for scanning probe lithography

David C. Tully, Kathryn Wilder, Jean Frechet, Alexander R. Trimble, Calvin F. Quate

Research output: Contribution to journalArticlepeer-review

107 Scopus citations

Abstract

Monolayers of dendritic polymers were prepared by covalent attachment to a silicon wafer surface. Field enhanced oxidation of the monolayers was performed on a silicon surface using scanning probe lithography (SPL) to create features with dimensions below 60 nm. The dendrimer films were found to be resistant to a wet HF etch, thus, allowed to produce a positive-tone image as the patterned oxide itself relief features are etched away.

Original languageEnglish (US)
Pages (from-to)314-318
Number of pages5
JournalAdvanced Materials
Volume11
Issue number4
DOIs
StatePublished - Jan 1 1999

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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