Dendrimer-based chemically amplified resist materials

David C. Tully, Alexander R. Trimble, Jean Frechet

Research output: Contribution to journalConference articlepeer-review

6 Scopus citations

Abstract

Several new dendrimers have been synthesized which contain acid thermally labile groups on their periphery. The tert-butyl ester and carbonate peripheral groups can be removed by an acid catalyzed thermolysis to drastically alter the solubility properties of the dendrimer, thus forming the basis for a two-tone chemically amplified resist material. A chemically amplified resist based on a dendritic polymer was demonstrated. This two-tone systems shows a high sensitivity towards both DUV and electron beam irradiation.

Original languageEnglish (US)
Pages (from-to)142-143
Number of pages2
JournalAmerican Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Volume41
Issue number1
StatePublished - Mar 1 2000
EventThe San Francisco Meeting - San Francisco, CA, USA
Duration: Mar 26 2000Mar 31 2000

ASJC Scopus subject areas

  • Polymers and Plastics

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