Deep-UV patterning of commercial grade PMMA for low-cost, large-scale microfluidics

M. Haiducu*, M. Rahbar, Ian Grant Foulds, R. W. Johnstone, D. Sameoto, M. Parameswaran

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

26 Scopus citations

Abstract

Although PMMA can be exposed using a variety of exposure sources, deep-UV at 254 nm is of interest because it is relatively inexpensive. Additionally, deep-UV sources can be readily scaled to large area exposures. Moreover, this paper will show that depths of over 100νm can be created in commercial grade PMMA using an uncollimated source. These depths are sufficient for creating microfluidic channels. This paper will provide measurements of the dissolution depth of commercial grade PMMA as a function of the exposure dose and etch time, using an IPA:H2O developer. Additionally, experiments were run to characterize the dependence of the dissolution rate on temperature and agitation. The patterned substrates were thermally bonded to blank PMMA pieces to enclose the channels and ports were drilled into the reservoirs. The resulting fluidic systems were then tested for leakage. The work herein presents the patterning, development and system behaviour of a complete microfluidics system based on commercial grade PMMA.

Original languageEnglish (US)
Article number115029
JournalJournal of Micromechanics and Microengineering
Volume18
Issue number11
DOIs
StatePublished - Nov 1 2008

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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