Control of the out-of-plane curvature in SU-8 compliant microstructures by exposure dose and baking times

D. Sameoto*, S. H. Tsang, Ian Grant Foulds, S. W. Lee, M. Parameswaran

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

30 Scopus citations

Abstract

The effect of processing conditions on the curvature of SU-8 cantilevers up to 6400 νm long is determined by experimental methods. Our observations suggest that a zero curvature condition can be achieved by controlling the exposure dose and post-exposure baking time for any given SU-8 thickness. The curvature of SU-8 cantilevers processed with different exposure doses and post-exposure baking times has been measured and reveals that the gradient of crosslinking density throughout the SU-8 film is the cause of out-of-plane stress. A general model for the SU-8 cantilever curvature is developed which explains the behavior of SU-8 structures that have been processed with different conditions and can be used to predict the general effect on the SU-8 cantilever curvature for different SU-8 thicknesses and process parameters.

Original languageEnglish (US)
Article number032
Pages (from-to)1093-1098
Number of pages6
JournalJournal of Micromechanics and Microengineering
Volume17
Issue number5
DOIs
StatePublished - May 1 2007

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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