Comparison of effective work function extraction methods using capacitance and current measurement techniques

Huang Chun Wen*, Rino Choi, George A. Brown, Tim Böscke, Kenneth Matthews, Harlan R. Harris, Kisik Choi, Husam Niman Alshareef, Hongfa Luan, Gennadi Bersuker, Prashant Majhi, Dim Lee Kwong, Byoung Hun Lee

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

36 Scopus citations

Abstract

The effective work function (EWF) extracted on terraced oxide structures by capacitance-voltage-based techniques was compared with the work function calculated from the barrier height extracted by current-voltage measurements. The results show a reasonable correlation-within ± 0.1 eV - in the EWF values for various metal gate electrodes, validating both techniques for EWF extraction.

Original languageEnglish (US)
Pages (from-to)598-601
Number of pages4
JournalIEEE Electron Device Letters
Volume27
Issue number7
DOIs
StatePublished - Jul 1 2006

Keywords

  • Barrier height
  • High-κ
  • Metal gate
  • Work function

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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