Characterization of nanocrystalline diamond films implanted with nitrogen ions

Tao Xu*, Shengrong Yang, Jinjun Lu, Qunji Xue, Jingqi Li, Wantu Guo, Yining Sun

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    73 Scopus citations

    Abstract

    Nanocrystalline diamond films, prepared by a microwave plasma-enhanced CVD, were implanted using 110-keV nitrogen ions under fluence ranging from 1016-1017 ions cm-2. AFM, XRD, XPS and Raman spectroscopy were used to analyze the changes in surface structure and chemical state of the films before and after implantation. Results show that high-fluence nitrogen ions implanted in the nanocrystalline diamond film cause a decline in diamond crystallinity and a swelling of the crystal lattice; the cubic-shaped diamond grains in the film transform into similar roundish-shaped grains due to the sputtering effect of implanted nitrogen ions. Nitrogen-ion implantation changes the surface chemical state of the nanocrystalline diamond film. After high-fluence implantation, the surface of the film is completely covered by a layer of oxygen-containing groups. This phenomenon plays an importance role in the reduction of the adhesive friction between an Al2O3 ball and the nanocrystalline diamond film.

    Original languageEnglish (US)
    Pages (from-to)1441-1447
    Number of pages7
    JournalDiamond and Related Materials
    Volume10
    Issue number8
    DOIs
    StatePublished - Jan 1 2001

    Keywords

    • Chemical vapor deposition(CVD)
    • Friction
    • Ion implantation
    • Nanocrystalline diamond films

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Chemistry(all)
    • Mechanical Engineering
    • Materials Chemistry
    • Electrical and Electronic Engineering

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