Bias bffects in facirg targets sputtering on the structure and magnetic properties of NdFeMo thin films

Chang Qinq Sun, En Yong Jiang, Xixiang Zhang, Yu Guang Liu, Qi Lu

Research output: Contribution to journalArticlepeer-review


Dc substrate biasing Vb is an important parameter for modulating the structure and magnetic properties of Facing Targets Sputtered (FTS) films. The effect of Vb is to promote diffusion and cause the resputtering of adatoms, and it also affects the deposition rate R and substrate temperature Ts.

Original languageEnglish (US)
Pages (from-to)3339-3340
Number of pages2
JournalIEEE Transactions on Magnetics
Issue number5
StatePublished - Jan 1 1989

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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