Base-sensitive polymers as imaging materials: Radiation-induced β-elimination to yield poly(4-hydroxystyrene)

Edward J. Urankar, Isabella Brehm, Q. Jason Niu, Jean Frechet*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

29 Scopus citations

Abstract

A novel family of functionalized polystyrenes that are susceptible to base-catalyzed β-elimination is reported. A study of the thermal behaviors of poly[(((((2-cyano-1,1-dimethylethyl)oxy)-carbonyl)oxy)styrene], poly[(((2-cyanoethoxy)carbonyl)oxy)styrene], and poly[((((2-methylsulfonyl)ethoxy)-carbonyl)oxy)styrene] confirms that they undergo facile and quantitative elimination of their side chain groups in a process that is susceptible to base catalysis. Imaging of these polymer systems was accomplished using the novel ,4,4′-[bis[[(2-nitrobenzyl)oxy]carbonyl]trimethylene)dipiperidine as an amine photogenerator. Copolymerization of ((((2-cyano-1,1-dimethylethyl)oxy)carbonyl)oxy)styrene and ((t-butoxycarbonyl)oxy)styrene followed by selective deprotection of the t-BOC protecting groups with acid enabled the synthesis of a base-sensitive copolymer containing free phenol units with enhanced thin-film properties.

Original languageEnglish (US)
Pages (from-to)1304-1310
Number of pages7
JournalMacromolecules
Volume30
Issue number5
DOIs
StatePublished - Mar 10 1997

ASJC Scopus subject areas

  • Organic Chemistry
  • Polymers and Plastics
  • Inorganic Chemistry
  • Materials Chemistry

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