Amorphous silicon and silicon nitride channel optical waveguides

Edvige Celasco*, Marzia Quaglio, Angelica Chiodoni, Carlo Ricciardi, Candido Fabrizio Pirri, Lorenzo Dominici, Francesco Michelotti, Francesco De Angelis, Enzo Di Fabrizio, Fabrizio Giorgis

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations

Abstract

In this work we report on the characterisation of multimode rectangular ridge waveguides fabricated by Plasma Enhanced Chemical Vapor Deposition and anisotropic etching using different cores, consisting of hydrogenated amorphous silicon and amorphous silicon nitride. The propagation losses have been measured at several wavelengths by an end-fire coupling setup and compared to intrinsic absorption of the core materials. Two-dimensional photonic crystal structures have been carved onto the channel waveguides by Focused Ion Beam lithography demonstrating the possibility to fabricate complex optical elements merging the consolidated amorphous silicon growth technology with ion-beam nanomachining.

Original languageEnglish (US)
Pages (from-to)836-839
Number of pages4
JournalPhysica Status Solidi (C) Current Topics in Solid State Physics
Volume7
Issue number3-4
DOIs
StatePublished - May 27 2010
Event23rd International Conference on Amorphous and Nanocrystalline Semiconductors, ICANS23 - Utrecht, Netherlands
Duration: Aug 23 2009Aug 28 2009

ASJC Scopus subject areas

  • Condensed Matter Physics

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