Alternative approaches for high-k/metal gate CMOS: Low temperature process (gate last) and SiGe channel

C. S. Park, Muhammad Mustafa Hussain, K. Tateiw, J. Huang, J. Lin, T. Ngai, S. Lian, K. Rader, B. Taylor, P. D. Kirsch, R. Jammy

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

7 Scopus citations

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Engineering & Materials Science