AFM-induced amine deprotection: Triggering localized bond cleavage by application of tip/substrate voltage bias for the surface self-assembly of nanosized dendritic objects

Zachary M. Fresco, Itai Suez, Scott A. Backer, Jean Frechet*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

38 Scopus citations

Abstract

An α,α-dimethyl-3,5-dimethoxybenzyloxycarbonyl (DDZ)-protected amine monolayer can be selectively deprotected by the application of a voltage bias from a conducting AFM tip to afford localized nanoscale patterns that can be visualized by self-assembly of dendritic molecular objects with terminal carboxylic acid groups and different aspect ratios.

Original languageEnglish (US)
Pages (from-to)8374-8375
Number of pages2
JournalJournal of the American Chemical Society
Volume126
Issue number27
DOIs
StatePublished - Jul 14 2004

ASJC Scopus subject areas

  • Catalysis
  • Chemistry(all)
  • Biochemistry
  • Colloid and Surface Chemistry

Fingerprint

Dive into the research topics of 'AFM-induced amine deprotection: Triggering localized bond cleavage by application of tip/substrate voltage bias for the surface self-assembly of nanosized dendritic objects'. Together they form a unique fingerprint.

Cite this