A Positive Tone Plasma-Developable Resist Obtained by Gas-Phase Image Reversal

Scott A. MacDonald*, Nicholas J. Clecak, Grant C. Willson, Hubert Schlosser, Jean Frechet

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

This paper describes a gas-phase image reversal process that generates a positive tone, plasma-developable image from a chemically amplified photoresist system. This system is based on the catalytic photogeneration of phenolic hydroxyl groups within the resist film that react, in subsequent steps, with either a silylating agent or an isocyanate that is delivered in the gas phase. This forms silyl ethers and carbamates within the polymeric film. The regions of the film containing the organosilicon species are not etched in an oxygen plasma environment. Correspondingly, the carbamate regions of the film are rapidly etched in an oxygen plasma. The overall process results in a positive tone image after development in an oxygen plasma.

Original languageEnglish (US)
Pages (from-to)1364-1368
Number of pages5
JournalChemistry of Materials
Volume4
Issue number6
DOIs
StatePublished - Feb 1 1992
Externally publishedYes

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Chemistry

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