3D patterning by means of nanoimprinting, X-ray and two-photon lithography

M. Tormen, L. Businaro, M. Altissimo, F. Romanato, S. Cabrini, F. Perennes, R. Proietti, Hong Bo Sun, Satoshi Kawata, Enzo Di Fabrizio*

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

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