3D microstructures fabricated by partially opaque X-ray lithography masks

S. Cabrini*, M. Gentili, E. Di Fabrizio, A. Gerardino, A. Nottola, Q. Leonard, L. Mastrogiacomo

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

X-ray lithography has several advantages over optical or e-beam techniques, since x-ray proximity printing can overcome typical limitations of such techniques, enabling the imaging of ultra thick resist layers (micro-mechanical application). In this work we will discuss the fabrication of a multilevel x-ray mask capable of producing a radiation dose modulation when used in a typical proximity x-ray lithography set-up. The aim of our investigation is develop a process that in a single x-ray exposure can replicate a multilevel mask profile. The mask was realised by e-beam lithography and made by a number of overlapped gold layers, so producing a modulation of the x-ray dose absorption. We describe in some detail the process for the fabrication of the mask and the first result of the x-ray exposure.

Original languageEnglish (US)
Pages (from-to)599-602
Number of pages4
JournalMicroelectronic Engineering
Volume53
Issue number1
DOIs
StatePublished - Jun 2000
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of '3D microstructures fabricated by partially opaque X-ray lithography masks'. Together they form a unique fingerprint.

Cite this