Metal Reactive Ion Etcher and Strip

    Gheorghe Iordache (Manager)

Equipment/facility: Equipment

  • Location

    King Abdullah University of Science and Technology Thuwal 23955

    Saudi Arabia

Equipments Details

Description

Metal Reactive-ion etching - RIE - for substrates that can be chemically etched with chlorine and their compounds.
Model: Plasmalab 100 - ICP 380, up to 200mm
Photo associated with equipment

Details

NameMetal Reactive Ion Etcher and Strip
Acquisition date04/1/10
ManufacturersOxford Instruments Group Plc

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